Microstructural and magnetic properties of thermally mixed Ni/Si bilayers

• Published in: Journal of physics. D, Applied physics Vol. 41; no. 9; pp. 095003 - 095003 (6)
• Main Authors: Zhang, K, Lieb, K P, Bibić, N, Pilet, N, Ashworth, T V, Marioni, M A, Hug, H J
• Format: Journal Article
• Language: English
• Published: Bristol IOP Publishing 07.05.2008; Institute of Physics
• Subjects: Condensed matter: electronic structure, electrical, magnetic, and optical properties; Exact sciences and technology; Interfacial magnetic properties (multilayers, magnetic quantum wells, superlattices, magnetic heterostructures); Magnetic properties and materials; Magnetic properties of surface, thin films and multilayers; Physics; RBS; Annealing; Magnetization; Grain growth; Kerr magneto-optical effect; Polycrystals; Interdiffusion; XRD; Magnetic force microscopy; Thickness; Stress relaxation; Coercive force; Nickel; Silicon; Electron beam evaporation; Bilayers
• ISSN: 0022-3727; 1361-6463
• DOI: 10.1088/0022-3727/41/9/095003

Polycrystalline nickel layers, deposited on Si(1 1 0) wafers via electron beam evaporation to a thickness of 29 or 68-70 nm, were thermally annealed in vacuo at 493 or 530 K. The elemental interdiffusion across the Ni/Si interface was measured by means of Rutherford backscattering spectroscopy, and the relaxation of stress and grain growth by means of x-ray diffraction. At 530 K, a slight logarithmic increase in the interface variance with the annealing time, but no crystalline silicide formation was observed. The in-plane magneto-optical Kerr effect and magnetic force microscopy were used to investigate the changes in the magnetic properties. With increasing annealing time, the decrease in coercivity and gain in magnetic remanence were correlated with the relaxation of stress. Similarities with ion-irradiated Ni/Si couples will be discussed.