Optical and X-Ray Investigation of Indium Oxide Films on Sapphire Substrates

• Published in: Journal of applied spectroscopy Vol. 88; no. 5; pp. 975 - 979
• Main Authors: Tikhii, A. A., Svyrydova, K. A., Zhikhareva, Y. I., Zhikharev, I. V.
• Format: Journal Article
• Language: English
• Published: New York Springer US 01.11.2021; Springer; Springer Nature B.V
• Subjects: Aluminum oxide; Analysis; Analytical Chemistry; Atomic/Molecular Structure and Spectra; Crystallites; Deposition; Dielectric films; Indium; Indium oxides; Investigations; Magnetron sputtering; Oxide coatings; Physics; Physics and Astronomy; Refractivity; Sapphire; Substrates; Thin films; Transition layers; indium oxide; x-ray analysis; thin film; ellipsometry; optical transmission
• ISSN: 0021-9037; 1573-8647
• DOI: 10.1007/s10812-021-01268-3

The results of ellipsometric, x-ray, and spectral studies of In 2 O 3 films deposited by dc-magnetron sputtering on Al 2 O 3 (012) substrates are presented. The experimental data are interpreted in terms of a three-layer model of the fi lm. It is assumed that large particles of the material are formed on the surface of the substrate at the beginning of the deposition process. The size of the crystallites then decreases, and they fill the gaps between the larger particles, after which the film formation goes into the stationary mode. It was shown that there is a transition layer with a band gap of 1.39 eV, a refractive index of ~3, and thickness of 25 nm at the interface between the film and the substrate. The properties of this layer do not depend on the deposition time.