Preparation and characterization of nanostructured copper bismuth diselenide thin films from a chemical route
Thin films of copper bismuth diselenide were prepared by chemical bath deposition technique ontoglass substrate below 60°C. The deposition parameters such as time, temperature of deposition and pH of the solution, were optimized. The set of films having different elemental compositions was prepared...
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Published in | Bulletin of materials science Vol. 33; no. 6; pp. 663 - 670 |
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Main Authors | , |
Format | Journal Article |
Language | English |
Published |
India
Springer-Verlag
01.12.2010
Springer Nature B.V |
Subjects | |
Online Access | Get full text |
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Summary: | Thin films of copper bismuth diselenide were prepared by chemical bath deposition technique ontoglass substrate below 60°C. The deposition parameters such as time, temperature of deposition and pH of the solution, were optimized. The set of films having different elemental compositions was prepared by varying Cu/Bi ratio from 0·13–1·74. Studies on structure, composition, morphology, optical absorption and electrical conductivity of the films were carried out and discussed. Characterization includes X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), energy dispersive X-ray analysis (EDAX), absorption spectroscopy, and electrical conductivity. The results are discussed and interpreted. |
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Bibliography: | ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 23 |
ISSN: | 0250-4707 0973-7669 |
DOI: | 10.1007/s12034-011-0147-8 |