Preparation and characterization of nanostructured copper bismuth diselenide thin films from a chemical route

Thin films of copper bismuth diselenide were prepared by chemical bath deposition technique ontoglass substrate below 60°C. The deposition parameters such as time, temperature of deposition and pH of the solution, were optimized. The set of films having different elemental compositions was prepared...

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Bibliographic Details
Published inBulletin of materials science Vol. 33; no. 6; pp. 663 - 670
Main Authors BARI, R H, PATIL, L A
Format Journal Article
LanguageEnglish
Published India Springer-Verlag 01.12.2010
Springer Nature B.V
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Summary:Thin films of copper bismuth diselenide were prepared by chemical bath deposition technique ontoglass substrate below 60°C. The deposition parameters such as time, temperature of deposition and pH of the solution, were optimized. The set of films having different elemental compositions was prepared by varying Cu/Bi ratio from 0·13–1·74. Studies on structure, composition, morphology, optical absorption and electrical conductivity of the films were carried out and discussed. Characterization includes X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), energy dispersive X-ray analysis (EDAX), absorption spectroscopy, and electrical conductivity. The results are discussed and interpreted.
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ISSN:0250-4707
0973-7669
DOI:10.1007/s12034-011-0147-8