A Few Techniques for Preparing Conductive Material Films for Sputtering-Type Electron Cyclotron Resonance Microwave Plasma

A few techniques are developed for preparing conductive material films for sputtering type electron cyclotron resonance microwave plasma. Microwave pressure window contamination, which is the most serious obstacle to conductive film preparation, can be avoided by using a vacuum microwave guide. Dens...

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Bibliographic Details
Published inJapanese Journal of Applied Physics Vol. 28; no. 3; pp. L503 - L506
Main Authors Matsuoka, M, Ono, K
Format Journal Article
LanguageEnglish
Published 01.03.1989
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