Instant, multiscale dry transfer printing by atomic diffusion control at heterogeneous interfaces

Transfer printing is a technique that integrates heterogeneous materials by readily retrieving functional elements from a grown substrate and subsequently printing them onto a specific target site. These strategies are broadly exploited to construct heterogeneously integrated electronic devices. A t...

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Published inScience advances Vol. 7; no. 28
Main Authors Heo, Seungkyoung, Ha, Jeongdae, Son, Sook Jin, Choi, In Sun, Lee, Hyeokjun, Oh, Saehyuck, Jekal, Janghwan, Kang, Min Hyung, Lee, Gil Ju, Jung, Han Hee, Yea, Junwoo, Lee, Taeyoon, Lee, Youngjeon, Choi, Ji-Woong, Xu, Sheng, Choi, Joon Ho, Jeong, Jae-Woong, Song, Young Min, Rah, Jong-Cheol, Keum, Hohyun, Jang, Kyung-In
Format Journal Article
LanguageEnglish
Published United States American Association for the Advancement of Science 01.07.2021
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Summary:Transfer printing is a technique that integrates heterogeneous materials by readily retrieving functional elements from a grown substrate and subsequently printing them onto a specific target site. These strategies are broadly exploited to construct heterogeneously integrated electronic devices. A typical wet transfer printing method exhibits limitations related to unwanted displacement and shape distortion of the device due to uncontrollable fluid movement and slow chemical diffusion. In this study, a dry transfer printing technique that allows reliable and instant release of devices by exploiting the thermal expansion mismatch between adjacent materials is demonstrated, and computational studies are conducted to investigate the fundamental mechanisms of the dry transfer printing process. Extensive exemplary demonstrations of multiscale, sequential wet-dry, circuit-level, and biological topography-based transfer printing demonstrate the potential of this technique for many other emerging applications in modern electronics that have not been achieved through conventional wet transfer printing over the past few decades.
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These authors contributed equally to this work.
ISSN:2375-2548
2375-2548
DOI:10.1126/sciadv.abh0040