Ultraweak background scattered light reveals structure of a diffractive element

Background scattered light should normally be reduced in industrial fabrication processes; however, we demonstrated that background scattered light from an optical element contains significant structural information about the element. This was revealed by quite good agreement between the measured sc...

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Bibliographic Details
Published inOptics letters Vol. 38; no. 19; p. 3862
Main Authors Hakko, Manabu, Kiire, Tomohiro, Barada, Daisuke, Yatagai, Toyohiko, Hayasaki, Yoshio
Format Journal Article
LanguageEnglish
Published United States 01.10.2013
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Summary:Background scattered light should normally be reduced in industrial fabrication processes; however, we demonstrated that background scattered light from an optical element contains significant structural information about the element. This was revealed by quite good agreement between the measured scattering intensity distribution of a sample and a computer simulation of the light intensity from the sample. The intensity distribution from a carefully fabricated sample with artificially controlled defects was obtained with a measurement system designed to measure ultraweak background scattered light covering an intensity range of over 10(10).
ISSN:1539-4794
DOI:10.1364/ol.38.003862