A nanofluidic channel with embedded transverse nanoelectrodes

In this paper, we demonstrate fabrication and characterization of a nanofluidic channel with embedded transverse nanoelectrodes using a combination of conventional photolithography and focused ion beam technologies. Glass-capped silicon dioxide nanochannels having 20 nm depth, 50 nm width, and 2 mic...

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Bibliographic Details
Published inNanotechnology Vol. 20; no. 10; p. 105302
Main Authors Maleki, T, Mohammadi, S, Ziaie, B
Format Journal Article
LanguageEnglish
Published England IOP Publishing 11.03.2009
Subjects
Equipment Design
Equipment Failure Analysis
Micro-Electrical-Mechanical Systems - instrumentation
Microelectrodes
Microfluidic Analytical Techniques - instrumentation
Nanotechnology - instrumentation
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Summary:In this paper, we demonstrate fabrication and characterization of a nanofluidic channel with embedded transverse nanoelectrodes using a combination of conventional photolithography and focused ion beam technologies. Glass-capped silicon dioxide nanochannels having 20 nm depth, 50 nm width, and 2 microm length with embedded platinum nanoelectrodes were fabricated. Channel patency was verified through measurements of the resistivity in phosphate buffered saline and electrostatic action on charged fluorescent nanospheres. Platinum nanoelectrode functionality was also tested using transverse resistance measurements in nanochannels filled with air, deionized water, and saline solution.
Bibliography:ObjectType-Article-1
SourceType-Scholarly Journals-1
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ISSN:0957-4484
1361-6528
DOI:10.1088/0957-4484/20/10/105302