High-efficiency electrochemical nitrate reduction to ammonia via boron-doped hydroxyl oxide cobalt induced electron delocalization
[Display omitted] Electrochemical nitrate reduction to ammonia is a promising alternative strategy for producing valuable ammonia. This prospective route, however, is subject to a slow electrocatalytic rate, which resulted from the weak adsorption and activation of intermediate species, and the low...
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Published in | Journal of colloid and interface science Vol. 676; pp. 560 - 568 |
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Main Authors | , , , , , , , , , , |
Format | Journal Article |
Language | English |
Published |
United States
Elsevier Inc
15.12.2024
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Subjects | |
Online Access | Get full text |
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Summary: | [Display omitted]
Electrochemical nitrate reduction to ammonia is a promising alternative strategy for producing valuable ammonia. This prospective route, however, is subject to a slow electrocatalytic rate, which resulted from the weak adsorption and activation of intermediate species, and the low density electron cloud of active centers. To address this issue, we developed a novel approach by doping boron into metal hydroxyl oxides to adjust the electronic structure of active centers, and consequently, led a significant improvement in the Faraday efficiency upto approaching 100 %, as well as an impressive ammonia yield upto approximately 23 mg/h mgcat−1 at −0.6 V vs. reversible hydrogen electrode (RHE). Experimental data in mechanism demonstrate that the doped boron play a crucial role in modulating the local electronic environment surrounding the active sites Co. In situ Raman and FTIR spectra provide evidences that boron facilitates the formation of deoxidation and hydrogenation intermediates. Additionally, density functional theory (DFT) calculations support the notion that boron doping enhances the adsorption capability of intermediates, reduces the reaction barrier, and facilitates the desorption of NH3. |
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Bibliography: | ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 23 |
ISSN: | 0021-9797 1095-7103 1095-7103 |
DOI: | 10.1016/j.jcis.2024.07.160 |