Anomalous low-temperature Coulomb drag in graphene-GaAs heterostructures

Vertical heterostructures combining different layered materials offer novel opportunities for applications and fundamental studies. Here we report a new class of heterostructures comprising a single-layer (or bilayer) graphene in close proximity to a quantum well created in GaAs and supporting a hig...

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Published inNature communications Vol. 5; no. 1; p. 5824
Main Authors Gamucci, A., Spirito, D., Carrega, M., Karmakar, B., Lombardo, A., Bruna, M., Pfeiffer, L. N., West, K. W., Ferrari, A. C., Polini, M., Pellegrini, V.
Format Journal Article
LanguageEnglish
Published London Nature Publishing Group UK 19.12.2014
Nature Publishing Group
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Summary:Vertical heterostructures combining different layered materials offer novel opportunities for applications and fundamental studies. Here we report a new class of heterostructures comprising a single-layer (or bilayer) graphene in close proximity to a quantum well created in GaAs and supporting a high-mobility two-dimensional electron gas. In our devices, graphene is naturally hole-doped, thereby allowing for the investigation of electron–hole interactions. We focus on the Coulomb drag transport measurements, which are sensitive to many-body effects, and find that the Coulomb drag resistivity significantly increases for temperatures <5–10 K. The low-temperature data follow a logarithmic law, therefore displaying a notable departure from the ordinary quadratic temperature dependence expected in a weakly correlated Fermi-liquid. This anomalous behaviour is consistent with the onset of strong interlayer correlations. Our heterostructures represent a new platform for the creation of coherent circuits and topologically protected quantum bits. Ultrathin layers that can confine electron motion to just two dimensions exhibit a wide range of unusual electronic properties. Gamucci et al . combine two very different examples of such systems—graphene and a gallium arsenide quantum well—and demonstrate interlayer coupling effects.
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ISSN:2041-1723
2041-1723
DOI:10.1038/ncomms6824