Near-infrared emission from mesoporous crystalline germanium

Mesoporous crystalline germanium was fabricated by bipolar electrochemical etching of Ge wafer in HF-based electrolyte. It yields uniform mesoporous germanium layers composed of high density of crystallites with an average size 5-7 nm. Subsequent extended chemical etching allows tuning of crystallit...

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Bibliographic Details
Published inAIP advances Vol. 4; no. 10; pp. 107128 - 107128-5
Main Authors Boucherif, Abderraouf, Korinek, Andreas, Aimez, Vincent, Arès, Richard
Format Journal Article
LanguageEnglish
Published Melville American Institute of Physics 01.10.2014
AIP Publishing LLC
Subjects
CHEMICAL COMPOSITION
Chemical etching
Crystal structure
Crystallinity
Crystallites
DENSITY
Electrochemical etching
ELECTROLYTES
GERMANIUM
MATERIALS SCIENCE
NANOSCIENCE AND NANOTECHNOLOGY
NANOSTRUCTURES
Near infrared radiation
Organic chemistry
PHOTOLUMINESCENCE
Quantum confinement
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Summary:Mesoporous crystalline germanium was fabricated by bipolar electrochemical etching of Ge wafer in HF-based electrolyte. It yields uniform mesoporous germanium layers composed of high density of crystallites with an average size 5-7 nm. Subsequent extended chemical etching allows tuning of crystallites size while preserving the same chemical composition. This highly controllable nanostructure exhibits photoluminescence emission above the bulk Ge bandgap, in the near-infrared range (1095-1360nm) with strong evidence of quantum confinement within the crystallites.
ISSN:2158-3226
2158-3226
DOI:10.1063/1.4898643