Synthesis, properties and performances of electrodeposited bismuth telluride films

Bismuth telluride alloy films of uniform thickness have been successfully prepared by electrodeposition from a solution containing Bi3+ and HTeO2+ ions in 1 mol dm–3 nitric acid (pH = 0) on stainless steel. The electrodeposited films are monophasic and exhibit a polycrystalline structure (R[3 with c...

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Bibliographic Details
Published inJournal of materials chemistry Vol. 6; no. 5; pp. 773 - 779
Main Authors MAGRI, P, BOULANGER, C, LECUIRE, J.-M
Format Journal Article
LanguageEnglish
Published Cambridge Royal Society of Chemistry 1996
Subjects
Chemical Sciences
Cross-disciplinary physics: materials science; rheology
Electrodeposition, electroplating
Exact sciences and technology
Materials science
Methods of deposition of films and coatings; film growth and epitaxy
Physics
Inorganic compounds
Semiconductor materials
Electrical properties
Polycrystals
Binary compounds
N type conductivity
Experimental study
Film growth
Thickness
Bismuth tellurides
Crystal growth from solutions
Electrodeposition
Chemical composition
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Summary:Bismuth telluride alloy films of uniform thickness have been successfully prepared by electrodeposition from a solution containing Bi3+ and HTeO2+ ions in 1 mol dm–3 nitric acid (pH = 0) on stainless steel. The electrodeposited films are monophasic and exhibit a polycrystalline structure (R[3 with combining macron]m). The film composition is dependent on the electrolyte composition and the current density. The electrical properties of the electrodeposited samples have been determined. The obtained films are n-type semiconductors with high carrier concentration.
ISSN:0959-9428
1364-5501
DOI:10.1039/jm9960600773