Effect of Interface Roughness on Magnetoresistance and Magnetization Switching in Double-Barrier Magnetic Tunnel Junction

The three kinds of double-barrier magnetic tunnel junction (DMTJ) with or without amorphous ferromagnetic Co 70.5 Fe 4.5 Si 15 B 10 (in at. %) free-layer were investigated to understand the effect of the free-layer on the bias voltage dependence of tunneling magnetoresistance (TMR) ratio. The DMTJ s...

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Published inIEEE transactions on magnetics Vol. 45; no. 6; pp. 2396 - 2398
Main Authors Hwang, J.Y., Lee, S.Y., Lee, N.I., Yim, H.I., Kim, M.Y., Lee, W.C., Rhee, J.R., Chun, B.S., Kim, T.W., Kim, Y.K., Lee, S.S., Hwang, D.G., Ri, E.J.
Format Journal Article Conference Proceeding
LanguageEnglish
Published New York, NY IEEE 01.06.2009
Institute of Electrical and Electronics Engineers
The Institute of Electrical and Electronics Engineers, Inc. (IEEE)
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Summary:The three kinds of double-barrier magnetic tunnel junction (DMTJ) with or without amorphous ferromagnetic Co 70.5 Fe 4.5 Si 15 B 10 (in at. %) free-layer were investigated to understand the effect of the free-layer on the bias voltage dependence of tunneling magnetoresistance (TMR) ratio. The DMTJ structure consisted of Ta 45/Ru 9.5/IrMn 10/CoFe 7/AlO x /free-layer 7/AlO x /CoFe 7/IrMn 10/Ru 60 (thickness in nm). Various free layers, such as CoFe 7, CoFeSiB 7, and CoFe 1.5/CoFeSiB 4/CoFe 1.5 were prepared and compared. The roughness values of the interface between free-layer and tunnel barrier were confirmed by using the techniques of X-ray reflectivity and transmission electron microscopy. As a result, the amorphous free-layer made the interface roughness of DMTJ smoother, reducing the interlayer coupling field and suppressing the bias voltage dependence of TMR ratio at a given voltage.
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ISSN:0018-9464
1941-0069
DOI:10.1109/TMAG.2009.2018586