Split sputter mode: a novel sputtering method for flat-panel display manufacturing

Advanced static DC magnetron sputtering methods based on the magnet wobbling technique were investigated to achieve highly uniform and homogeneous metallization layers. The novel split sputter mode (SSM) method, wherein the deposition process is divided into two distinct steps, enables the AKT rotar...

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Bibliographic Details
Published inJournal of Information Display Vol. 12; no. 2; pp. 89 - 92
Main Authors Pieralisi, Fabio, Hanika, Markus, Scheer, Evelyn, Bender, Marcus
Format Journal Article
LanguageEnglish
Published Taylor & Francis 01.06.2011
한국정보디스플레이학회
Subjects
rotary cathode array
rotating magnets
static DC magnetron sputtering
전기공학
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Summary:Advanced static DC magnetron sputtering methods based on the magnet wobbling technique were investigated to achieve highly uniform and homogeneous metallization layers. The novel split sputter mode (SSM) method, wherein the deposition process is divided into two distinct steps, enables the AKT rotary cathode technology to provide excellent layer properties, while keeping a high production throughput. The effectiveness of the SSM technique was demonstrated through copper-coated large-area substrates.
Bibliography:G704-002168.2011.12.2.004
ISSN:1598-0316
2158-1606
DOI:10.1080/15980316.2011.569168