Achromatic wave plates for optical pickup units fabricated by use of imprint lithography

We report achromatic form-birefringence wave plates for optical pickup units. Material dispersion and structure dispersion are balanced in a rigorous multilayer design. A trilayer grating using SiN(x)/SiO(y)N(z)/SiO2 provides easily accessible process control points and relaxed fabrication tolerance...

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Bibliographic Details
Published inOptics letters Vol. 30; no. 19; p. 2614
Main Authors Deng, Xuegong, Liu, Feng, Wang, Jian J, Sciortino, Jr, Paul F, Chen, Lei, Liu, Xiaoming
Format Journal Article
LanguageEnglish
Published United States 01.10.2005
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Summary:We report achromatic form-birefringence wave plates for optical pickup units. Material dispersion and structure dispersion are balanced in a rigorous multilayer design. A trilayer grating using SiN(x)/SiO(y)N(z)/SiO2 provides easily accessible process control points and relaxed fabrication tolerance. We demonstrate precise patterning by using nanoimprint lithography on UV-curable polymers, alleviating a major fabrication challenge. The achromatic wave plates exhibit 90+/-3 degrees retardance and >95% transmittance as measured by a Mueller matrix method at wavelengths of 640-800 nm.
ISSN:0146-9592
DOI:10.1364/ol.30.002614