Application of High-Resolution Film for Lithography to Synchrotron X-Ray Topography

A high-resolution film for lithography is applied to a detector for synchrotron radiation topography, instead of a nuclear plate. The film shows much better resolution than that of the plate although exposure time an about 500 times longer is required. The size distribution of interstitial loops gro...

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Bibliographic Details
Published inJapanese Journal of Applied Physics Vol. 33; no. 8; pp. 4793 - 4794
Main Authors MIZUNO, K, IWAMI, M, HASHIMOTO, E, ITO, K, KINO, T
Format Journal Article
LanguageEnglish
Published Tokyo Japanese journal of applied physics 1994
Subjects
Exact sciences and technology
Instruments, apparatus, components and techniques common to several branches of physics and astronomy
Physics
X- and γ-ray instruments and techniques
High resolution
Photographic films
Lithography
Crystals
X radiation
Experimental study
Lattice defect
Synchrotron radiation
X-ray topography
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Summary:A high-resolution film for lithography is applied to a detector for synchrotron radiation topography, instead of a nuclear plate. The film shows much better resolution than that of the plate although exposure time an about 500 times longer is required. The size distribution of interstitial loops grown as vacancy sources in a nearly perfect aluminum crystal after a temperature rise is examined from the white beam topograph.
ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.33.4793