Characterization of thin-film interference effect due to surface roughness
The normal and diffuse reflectivity from a resist/aluminum system were measured with various resist thicknesses. The average surface roughness σ a of aluminum surfaces varied from 5.5 to 10.5 nm upon changing the sputtering conditions. The diffuse reflectivity at the air/aluminum interface increases...
Saved in:
Published in | Japanese Journal of Applied Physics Vol. 34; no. 7A; pp. 3754 - 3758 |
---|---|
Main Authors | , , |
Format | Journal Article |
Language | English |
Published |
Tokyo
Japanese journal of applied physics
1995
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | The normal and diffuse reflectivity from a resist/aluminum system were measured with various resist thicknesses. The average surface roughness σ
a
of aluminum surfaces varied from 5.5 to 10.5 nm upon changing the sputtering conditions. The diffuse reflectivity at the air/aluminum interface increases with surface roughness. This tendency is enhanced as the wavelength of incident light decreases. The interference effect for the resist/aluminum system decreases as the surface roughness increases. This tendency is enhanced when the resist absorptivity decreased. These results are analyzed with using the help of the “Swing” model. |
---|---|
ISSN: | 0021-4922 1347-4065 |
DOI: | 10.1143/jjap.34.3754 |