Local structure and conductivity of highly conductive vanadate glasses containing different metal oxides
Heat treatment of 20BaO· x M m O n ·(10− x )Fe 2 O 3 ·70V 2 O 5 glasses containing different metal oxides (M m O n ), such as Fe 2 O 3 , Al 2 O 3 , MnO 2 , CuO, Cu 2 O, ZnO, Ga 2 O 3 , GeO 2 , MoO 3 , SnO 2 and WO 3 , was accompanied by a remarkable decrease in DC -resistivity ( ρ ) at room temperat...
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Published in | Journal of materials science. Materials in electronics Vol. 31; no. 24; pp. 22881 - 22892 |
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Main Authors | , , , , , |
Format | Journal Article |
Language | English |
Published |
New York
Springer US
01.12.2020
Springer Nature B.V |
Subjects | |
Online Access | Get full text |
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Summary: | Heat treatment of 20BaO·
x
M
m
O
n
·(10−
x
)Fe
2
O
3
·70V
2
O
5
glasses containing different metal oxides (M
m
O
n
), such as Fe
2
O
3
, Al
2
O
3
, MnO
2
, CuO, Cu
2
O, ZnO, Ga
2
O
3
, GeO
2
, MoO
3
, SnO
2
and WO
3
, was accompanied by a remarkable decrease in
DC
-resistivity (
ρ
) at room temperature from the order of MΩ cm to Ω cm.
N
-type semiconductor model could be successfully applied to discuss the conduction mechanism. Introduction of CuO into network former (NWF) sites caused a remarkable change of
ρ
from 2.6 × 10
5
to 3.1 Ω cm when annealed at 450 °C for 30 min. Activation energy for conduction (
E
a
) decreased from 0.16 to 0.10 eV, suggesting an increased carrier density in the conduction band. Diffuse reflectance spectra of this glass showed a decrease in the bandgap energy (
E
g
) from 2.41 to 2.14 eV. Introduction of ZnO into network modifier (NWM) sites resulted in a remarkable decrease in
ρ
from 4.0 × 10
5
to 4.8 Ω cm after annealing at 450 °C for 30 min, together with a decrease in
E
a
from 0.23 to 0.14 eV. Diffuse reflectance spectra showed a decrease in
E
g
from 2.39 to 2.11 eV. These results prove that heat treatment of vanadate glass causes structural relaxation and concordant decrease in
E
a
and
E
g
which are responsible for the remarkable increase in the high conductivity. |
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ISSN: | 0957-4522 1573-482X |
DOI: | 10.1007/s10854-020-04815-4 |