Three-Step Growth Optimization of AlN Epilayers by MOCVD

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Bibliographic Details
Published inChinese physics letters Vol. 25; no. 6; pp. 2265 - 2268
Main Authors Ming-Zeng, Peng, Li-Wei, Guo, Jie, Zhang, Nai-Sen, Yu, Xue-Liang, Zhu, Jian-Feng, Yan, Bin-Hui, Ge, Hai-Qiang, Jia, Hong, Chen, Jun-Ming, Zhou
Format Journal Article
LanguageEnglish
Published IOP Publishing 01.06.2008
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ISSN:0256-307X
1741-3540
DOI:10.1088/0256-307X/25/6/094