Production Strategies of TiNx Coatings via Reactive High Power Impulse Magnetron Sputtering for Selective H2 Separation

This scientific work aims to optimize the preparation of titanium nitride coatings for selective H2 separation using the Reactive High Power Impulse Magnetron Sputtering technology (RHiPIMS). Currently, nitride-based thin films are considered promising membranes for hydrogen. The first series of TiN...

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Published inMembranes (Basel) Vol. 11; no. 5; p. 360
Main Authors Mortalò, Cecilia, Deambrosis, Silvia Maria, Montagner, Francesco, Zin, Valentina, Fabrizio, Monica, Pasquali, Luca, Capelli, Raffaella, Montecchi, Monica, Miorin, Enrico
Format Journal Article
LanguageEnglish
Published Basel MDPI AG 15.05.2021
MDPI
Subjects
Alumina
Aluminum oxide
chemical robustness under h2
Coatings
Energy
Heat treatment
high power impulse magnetron sputtering
Hydrogen
Magnetron sputtering
Membranes
Microstructure
Morphology
Oxidation
porous ceramic substrates
Semiconductors
Separation
Silicon wafers
Stoichiometry
Structural stability
Substrates
Thin films
TiNx film membranes
Titanium
Titanium nitride
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Summary:This scientific work aims to optimize the preparation of titanium nitride coatings for selective H2 separation using the Reactive High Power Impulse Magnetron Sputtering technology (RHiPIMS). Currently, nitride-based thin films are considered promising membranes for hydrogen. The first series of TiNx/Si test samples were developed while changing the reactive gas percentage (N2%) during the process. Obtained coatings were extensively characterized in terms of morphology, composition, and microstructure. A 500 nm thick, dense TiNx coating was then deposited on a porous alumina substrate and widely investigated. Moreover, the as-prepared TiNx films were heat-treated in an atmosphere containing hydrogen in order to prove their chemical and structural stability; which revealed to be promising. This study highlighted how the RHiPIMS method permits fine control of the grown layer’s stoichiometry and microstructure. Moreover, it pointed out the need for a protective layer to prevent surface oxidation of the nitride membrane by air and the necessity to deepen the study of TiNx/alumina interface in order to improve film/substrate adhesion.
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ISSN:2077-0375
2077-0375
DOI:10.3390/membranes11050360