Properties of atomic layer deposited iron oxide and bismuth oxide chloride structures
Two-component crystalline thin film structures consisting of continuous ε-Fe2O3 bottom layers followed by top layers of BiOCl nanoflakes were grown using atomic layer deposition from FeCl3 and BiCl3 at 375 °C. Si(100) planar wafer, three-dimensional Si structures and conductive TiN/Si were exploited...
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Published in | Journal of alloys and compounds Vol. 846; p. 156099 |
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Main Authors | , , , , , , , , |
Format | Journal Article |
Language | English |
Published |
Lausanne
Elsevier B.V
15.12.2020
Elsevier BV |
Subjects | |
Online Access | Get full text |
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Summary: | Two-component crystalline thin film structures consisting of continuous ε-Fe2O3 bottom layers followed by top layers of BiOCl nanoflakes were grown using atomic layer deposition from FeCl3 and BiCl3 at 375 °C. Si(100) planar wafer, three-dimensional Si structures and conductive TiN/Si were exploited as substrates. Electrical measurements revealed that the deposited structures were moderately leaky, as the structures showed rectifying behavior affected by visible illumination. Magnetization in these films in the as-deposited state was nonlinear, saturative, and exhibited well-defined coercive fields. Annealing changed the surface morphology, phase composition and reduced the magnetic behavior of the thin films.
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•Two-layer ε-Fe2O3 – BiOCl composites were deposited using atomic layer deposition.•The ε-Fe2O3 – BiOCl demonstrates rectifying behavior affected by visible illumination.•The highest coercive fields approached 10 kOe.•Annealing changed the phase composition, morphology and reduced the magnetic behavior. |
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ISSN: | 0925-8388 1873-4669 |
DOI: | 10.1016/j.jallcom.2020.156099 |