Effect of Electron Density on Extreme Ultraviolet Output of a Z-Pinch Xe Discharge Produced Plasma Source

The extreme ultraviolet (EUV) source has many applications, including EUV lithography, EUV diagnostics, and so on. Numerous research groups have developed many EUV light sources and studied their characteristics. In this paper, we measured the temporal EUV emission of a Xe discharge produced plasma...

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Bibliographic Details
Published inJapanese Journal of Applied Physics Vol. 50; no. 6; pp. 06GB09 - 06GB09-4
Main Authors Huang, Bin, Takimoto, Yasuhiro, Watanabe, Masato, Hotta, Eiki
Format Journal Article
LanguageEnglish
Published The Japan Society of Applied Physics 01.06.2011
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ISSN0021-4922
1347-4065
DOI10.1143/JJAP.50.06GB09

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Summary:The extreme ultraviolet (EUV) source has many applications, including EUV lithography, EUV diagnostics, and so on. Numerous research groups have developed many EUV light sources and studied their characteristics. In this paper, we measured the temporal EUV emission of a Xe discharge produced plasma (DPP) EUV source and later, attempted to clarify the relationship between electron density evolution and EUV emission. The maximum EUV emission occurred at the optimum electron density of about $10^{19}$ cm -3 . A preliminarily discussion of the relationship between EUV radiation and electron density evolution based on these experimental results is presented.
Bibliography:(a) Schematic of the experimental setup; (b) structure of double nozzle gas jet type electrode. Schematic of the Nomarski interferometer system. (a) Example of current and EUV signal waveforms; (b) signal intensity vs electrode gap length; (c) signal intensity vs Xe gas pressure. Fringe pattern with plasma on (a) and its corresponding electron density profile (b). Development of electron density and EUV intensity with current pulse.
ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.50.06GB09