Magnetoresistance Characterization of NiFe Films With a Planar Point Contact

• Published in: IEEE transactions on magnetics Vol. 43; no. 6; pp. 3007 - 3009
• Main Author: Ohsawa, Y.
• Format: Journal Article Conference Proceeding
• Language: English
• Published: New York, NY IEEE 01.06.2007; Institute of Electrical and Electronics Engineers; The Institute of Electrical and Electronics Engineers, Inc. (IEEE)
• Subjects: Anisotropic magnetoresistance; Cross-disciplinary physics: materials science; rheology; Etching; Exact sciences and technology; Fabrication; Intermetallics; Iron compounds; Magnetic confinement; Magnetic domain walls; magnetic domains; Magnetic films; Magnetism; Magnetoresistance; Magnetoresistivity; Materials science; Mathematical analysis; Milling; Nickel base alloys; Nickel compounds; Optical films; Other topics in materials science; permalloy films; Physics; Polycarbonates; Scanning electron microscopy; Testing; Transmission electron microscopy; Nickel base alloys; permalloy films; Permalloy; Magnetic confinement; Magnetic domains; Magnetic materials; Magnetoresistance; Magnetic properties
• ISSN: 0018-9464; 1941-0069
• DOI: 10.1109/TMAG.2007.892179

Magnetoresistance (MR) characterization of NiFe films was performed with a point-contact (PC) whose size was varied from several hundreds to around ten nm 2 by the ion milling process. Two kinds of MR origin, which were estimated to be domain wall MR (DWMR) and anisotropic MR (AMR), were observed by analytical decomposition of the R-H curves. The MRs showed contrastive dependence on the PC conductance due to difference of area in which they occurred. The DWMR in the PC increased as the PC size decreased and reached to a maximum of about 12.5%. The DWMR dependence on the NiFe-PC size coincided with that of fitting approximation based on some previous reports