Influence of Annealing Temperature on the Microstructure and Morphology of TiN Films Synthesized by Dual Magnetron Sputtering

TiN films synthesized on leucosapphire substrates by dual magnetron sputtering have been annealed in vacuum at 600, 700, 800, and 900°C for 2 min. The microstructure and morphology of the films have been studied by X-ray diffraction and scanning electron microscopy at different temperatures. It has...

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Bibliographic Details
Published inTechnical physics Vol. 63; no. 8; pp. 1189 - 1193
Main Authors Zaitsev, S. V., Vashchilin, V. S., Prokhorenkov, D. S., Limarenko, M. V., Evtushenko, E. I.
Format Journal Article
LanguageEnglish
Published Moscow Pleiades Publishing 01.08.2018
Springer
Springer Nature B.V
Subjects
ANNEALING
Classical and Continuum Physics
Coatings
CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY
Magnetron sputtering
MAGNETRONS
MICROSTRUCTURE
Morphology
Movies
Physics
Physics and Astronomy
Physics of Nanostructures
ROUGHNESS
SCANNING ELECTRON MICROSCOPY
SPUTTERING
SUBSTRATES
Surface layers
Surface roughness
SURFACES
Synthesis
TEXTURE
Thin films
Titanium nitride
TITANIUM NITRIDES
X-RAY DIFFRACTION
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Summary:TiN films synthesized on leucosapphire substrates by dual magnetron sputtering have been annealed in vacuum at 600, 700, 800, and 900°C for 2 min. The microstructure and morphology of the films have been studied by X-ray diffraction and scanning electron microscopy at different temperatures. It has been found that annealing changes the microstructure, texture, grain size, and surface roughness of the TiN films.
ISSN:1063-7842
1090-6525
DOI:10.1134/S1063784218080236