Electrodeposition of Diamond-like Carbon Films on Silicon Substrates Using N,N-Dimethylformamid

Diamond-like carbon (DLC) films were synthesized by an electrodeposition technique on silicon (Si) substrates using liquid N , N -dimethylformamid (DMF). The electrodeposition was performed in the temperature range from 40 to 80°C and the applied voltage range from -1 kV to -5 kV. The structures of...

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Bibliographic Details
Published inJapanese Journal of Applied Physics Vol. 43; no. 9A; p. L1133
Main Authors Yasumori, Yoshio, Okada, Takumi, Kimura, Hideki, Choe, Il Yong, Kurosu, Tateki, Iida, Masamori
Format Journal Article
LanguageEnglish
Published 15.09.2004
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Summary:Diamond-like carbon (DLC) films were synthesized by an electrodeposition technique on silicon (Si) substrates using liquid N , N -dimethylformamid (DMF). The electrodeposition was performed in the temperature range from 40 to 80°C and the applied voltage range from -1 kV to -5 kV. The structures of the films were characterized by Raman spectroscopy. The films with the electrical resistivity of about 10 10 Ω·cm can be deposited using the liquid DMF under the liquid temperature of 80°C and the applied voltage of -2 kV. Moreover, the current density has an important role in the deposition of the films.
ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.43.L1133