Electronic and local atomistic structure of MgSiO3 glass under pressure: a study of X-ray Raman scattering at the silicon and magnesium L-edges
We applied X-ray Raman scattering technique to MgSiO 3 glass, a precursor to magnesium silicate melts, with respect to magnesium and silicon under high-pressure conditions as well as some polycrystalline phases of MgSiO 3 at ambient conditions. We also performed ab initio calculations to interpret t...
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Published in | Physics and chemistry of minerals Vol. 45; no. 2; pp. 211 - 218 |
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Main Authors | , |
Format | Journal Article |
Language | English |
Published |
Berlin/Heidelberg
Springer Berlin Heidelberg
01.02.2018
Springer Nature B.V |
Subjects | |
Online Access | Get full text |
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Summary: | We applied X-ray Raman scattering technique to MgSiO
3
glass, a precursor to magnesium silicate melts, with respect to magnesium and silicon under high-pressure conditions as well as some polycrystalline phases of MgSiO
3
at ambient conditions. We also performed ab initio calculations to interpret the X-ray Raman spectra. Experimentally obtained silicon
L
-edge spectra indicate that the local environment around silicon started changing at pressure above 10 GPa, where the electronic structure of oxygen is known to change. In contrast, the shape of the magnesium
L
-edge spectrum changed below 10 GPa. This indicates that the magnesium sites in MgSiO
3
glass first distort and that the local structure around magnesium shows a wide variation under pressure. The framework structure consisting of silicon and oxygen changed above 10 GPa, where the coordination number of silicon was more than four. Our results imply that 6-oxygen-coordinated silicon was formed above 20 GPa. |
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ISSN: | 0342-1791 1432-2021 |
DOI: | 10.1007/s00269-017-0909-y |