High-mobility patternable MoS2 percolating nanofilms
Fabrication of large-area and uniform semiconducting thin films of two-dimensional (2D) materials is paramount for the full exploitation of their atomic thicknesses and smooth surfaces in integrated circuits. In addition to elaborate vapor-based synthesis techniques for the wafer-scale growth of 2D...
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Published in | Nano research Vol. 14; no. 7; pp. 2255 - 2263 |
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Main Authors | , , , , , , |
Format | Journal Article |
Language | English |
Published |
Beijing
Tsinghua University Press
01.07.2021
|
Subjects | |
Online Access | Get full text |
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Summary: | Fabrication of large-area and uniform semiconducting thin films of two-dimensional (2D) materials is paramount for the full exploitation of their atomic thicknesses and smooth surfaces in integrated circuits. In addition to elaborate vapor-based synthesis techniques for the wafer-scale growth of 2D films, solution-based approaches for high-quality thin films from the liquid dispersions of 2D flakes, despite underdeveloped, are alternative cost-effective tactics. Here, we present layer-by-layer (LbL) assembly as an effective approach to obtaining scalable semiconducting films of molybdenum disulfide (MoS
2
) for field-effect transistors (FETs). LbL assembly is achieved by coordinating electrochemically exfoliated MoS
2
with cationic poly (diallyldimethylammonium chloride) (PDDA) through electrostatic interactions. The PDDA/MoS
2
percolating nanofilms show controlled and self-limited growth on a variety of substrates, and are easily patterned through lift-off processes. Ion gel gated FETs are fabricated on these MoS
2
nanofilms, and they show mobilities of 9.8 cm
2
·V
−1
·s
−
1, on/off ratios of 2.1 × 10
5
with operating voltages less than 2 V. The annealing temperature in the fabrication process can be as low as 200 °C, thereby permitting the fabrication of flexible FETs on polyethylene terephthalate substrates. The LbL assembly technique holds great promise for the large-scale fabrication of flexible electronics based on solution-processed 2D semiconductors. |
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Bibliography: | ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 14 |
ISSN: | 1998-0124 1998-0000 |
DOI: | 10.1007/s12274-020-3218-6 |