A Study of Cr–Al Oxides for Single-Layer Halftone Phase-Shifting Masks for Deep-Ultraviolet Region Photolithography

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Bibliographic Details
Published inJapanese Journal of Applied Physics Vol. 37; no. 7R; p. 4008
Main Authors Jiang, Zhong-Tao, Ohshimo, Kentaro, Aoyama, Mitsuru, Yamaguchi, Tomuo
Format Journal Article
LanguageEnglish
Published 01.07.1998
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ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.37.4008