Photoresist Removal using Atomic Hydrogen Generated by Heated Catalyzer

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Bibliographic Details
Published inJapanese Journal of Applied Physics Vol. 41; no. Part 1, No. 7A; pp. 4639 - 4641
Main Authors Izumi, Akira, Matsumura, Hideki
Format Journal Article
LanguageEnglish
Published 2002
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ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.41.4639