Improvements of stress controllability and radiation resistance by adding carbon to boron-nitride
The addition of an atom having different bonding radii to a matrix film is an effective method for changing the stress of the film. In plasma-enhanced CVD of BN, it is difficult to obtain tensile stress except for films rich in boron. The controllability of tensile stress in BN film was improved by...
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Published in | Journal of the Electrochemical Society Vol. 137; no. 7; pp. 2242 - 2246 |
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Main Authors | , , |
Format | Journal Article |
Language | English |
Published |
Pennington, NJ
Electrochemical Society
01.07.1990
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Subjects | |
Online Access | Get full text |
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Summary: | The addition of an atom having different bonding radii to a matrix film is an effective method for changing the stress of the film. In plasma-enhanced CVD of BN, it is difficult to obtain tensile stress except for films rich in boron. The controllability of tensile stress in BN film was improved by introducing a small amount of carbon into the BN matrix, using plasma-enhanced CVD between 400 and 500 C. Transparent films with high Young's modulus and tensile strength were obtained. The radiation resistance of boron-nitro-carbide deposited at 400 C was five times better than that of BN deposited by low-pressure CVD at similar temperatures. 13 refs. |
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Bibliography: | ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
ISSN: | 0013-4651 1945-7111 |
DOI: | 10.1149/1.2086919 |