Improvements of stress controllability and radiation resistance by adding carbon to boron-nitride

• Published in: Journal of the Electrochemical Society Vol. 137; no. 7; pp. 2242 - 2246
• Main Authors: YAMADA, M, NAKAISHI, M, SUGISHIMA, K
• Format: Journal Article
• Language: English
• Published: Pennington, NJ Electrochemical Society 01.07.1990
• Subjects: 360203 - Ceramics, Cermets, & Refractories- Mechanical Properties; 360206 - Ceramics, Cermets, & Refractories- Radiation Effects; 440200 - Radiation Effects on Instrument Components, Instruments, or Electronic Systems; 656001 - Condensed Matter Physics- Solid-State Plasma; ALLOYS; BORON COMPOUNDS; BORON NITRIDES; CARBON ADDITIONS; CHEMICAL COATING; CHEMICAL COMPOSITION; CHEMICAL VAPOR DEPOSITION; CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; Condensed matter: structure, mechanical and thermal properties; DEPOSITION; Exact sciences and technology; HARDENING; INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; LOW PRESSURE; MATERIALS SCIENCE; MECHANICAL PROPERTIES; NITRIDES; NITROGEN COMPOUNDS; Physical properties of thin films, nonelectronic; PHYSICAL RADIATION EFFECTS; Physics; PLASMA; PNICTIDES; RADIATION EFFECTS; RADIATION HARDENING; Solid surfaces and solid-solid interfaces; SOLID-STATE PLASMA; SURFACE COATING; Surface energy; thermodynamic properties; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties); TENSILE PROPERTIES; THIN FILMS; YOUNG MODULUS; Impurity density; Infrared absorption; X ray; Experimental study; Carbon; Chemical vapor deposition; Thin film; Young modulus; Energy gap; Tensile stress; Optical microscopy; Preparation; Borides nitrides; Irradiation; Residual stress
• ISSN: 0013-4651; 1945-7111
• DOI: 10.1149/1.2086919

The addition of an atom having different bonding radii to a matrix film is an effective method for changing the stress of the film. In plasma-enhanced CVD of BN, it is difficult to obtain tensile stress except for films rich in boron. The controllability of tensile stress in BN film was improved by introducing a small amount of carbon into the BN matrix, using plasma-enhanced CVD between 400 and 500 C. Transparent films with high Young's modulus and tensile strength were obtained. The radiation resistance of boron-nitro-carbide deposited at 400 C was five times better than that of BN deposited by low-pressure CVD at similar temperatures. 13 refs.