56 Gb/s Germanium Waveguide Electro-Absorption Modulator

We report a Germanium waveguide electro-absorption modulator with electro-optic bandwidth substantially beyond 50 GHz. The device is implemented in a fully integrated Si photonics platform on 200 mm silicon-on-insulator wafers with 220 nm top Si thickness. Wide open eye diagrams are demonstrated at...

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Bibliographic Details
Published inJournal of lightwave technology Vol. 34; no. 2; pp. 419 - 424
Main Authors Srinivasan, Srinivasan Ashwyn, Pantouvaki, Marianna, Gupta, Shashank, Hong Tao Chen, Verheyen, Peter, Lepage, Guy, Roelkens, Gunther, Saraswat, Krishna, Van Thourhout, Dries, Absil, Philippe, Van Campenhout, Joris
Format Journal Article
LanguageEnglish
Published New York IEEE 15.01.2016
The Institute of Electrical and Electronics Engineers, Inc. (IEEE)
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Summary:We report a Germanium waveguide electro-absorption modulator with electro-optic bandwidth substantially beyond 50 GHz. The device is implemented in a fully integrated Si photonics platform on 200 mm silicon-on-insulator wafers with 220 nm top Si thickness. Wide open eye diagrams are demonstrated at 1610 nm operation wavelength for nonreturn-to-zero on-off keying (NRZ-OOK) modulation at data rates as high as 56 Gb/s. Dynamic extinction ratios up to 3.3 dB are obtained by applying drive voltages of 2 V peak-to-peak, along with an optical insertion loss below 5.5 dB. The device has a low junction capacitance of just 12.8 fF, resulting in 12.8 fJ/bit of dynamic and ~1.2 mW of static power consumption in typical operating conditions. Wafer-scale performance data are presented and confirm the manufacturability of the device. The demonstrated modulator shows great potential for realizing high-density and low-power silicon photonic transceivers targeting short-reach optical interconnects at serial data rates of 56 Gb/s and beyond.
ISSN:0733-8724
1558-2213
DOI:10.1109/JLT.2015.2478601