Suppression of thermal conductivity without impeding electron mobility in n-type XNiSn half-Heusler thermoelectrics

We outline a strategy to improve the thermoelectric performance of n-type XNiSn based half-Heusler alloys through Cu doping into vacant tetrahedral sites. A comprehensive combination of structural characterisation and modelling is employed to discriminate the competing mechanisms for thermoelectric...

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Bibliographic Details
Published inJournal of materials chemistry. A, Materials for energy and sustainability Vol. 7; no. 47; pp. 27124 - 27134
Main Authors Barczak, S. A, Quinn, R. J, Halpin, J. E, Domosud, K, Smith, R. I, Baker, A. R, Don, E, Forbes, I, Refson, K, MacLaren, D. A, Bos, J. W. G
Format Journal Article
LanguageEnglish
Published Cambridge Royal Society of Chemistry 2019
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Summary:We outline a strategy to improve the thermoelectric performance of n-type XNiSn based half-Heusler alloys through Cu doping into vacant tetrahedral sites. A comprehensive combination of structural characterisation and modelling is employed to discriminate the competing mechanisms for thermoelectric enhancement. During synthesis a mineralising effect occurs that improves the homogeneity of the alloying elements Ti, Zr and Hf, and promotes grain growth, leading to a doubling of the electron mobility. In the formed materials, Cu is a strong n-type dopant, like Sb, but occupies the interstitial site and strongly enhances phonon scattering without diminishing carrier mobility (in contrast to interstitial Ni). Simultaneous alloying with Ti, Zr and Hf serves to minimise the thermal conductivity via regular mass disorder and strain effects. A best electronic power factor, S 2 / ρ , of 3.6 mW m −1 K −2 and maximum ZT of 0.8 at 773 K were observed for a Ti 0.5 Zr 0.25 Hf 0.25 NiCu 0.025 Sn composition, enabling promising device power densities of ∼6 W cm −2 and ∼8% conversion efficiency from a 450 K gradient. These findings are important because they provide new insight into the mechanisms underpinning high ZT in the XNiSn system and indicate a direction for further improvements in thermoelectric performance. Addition of Cu to XNiSn half-Heuslers improves homogeneity and reduces thermal conductivity without affecting electron mobility.
Bibliography:Electronic supplementary information (ESI) available: Tables with detailed structural information, details of the SPB analysis, Rietveld fits to SXRD and NPD data and additional electron microscopy images. See DOI
10.1039/c9ta10128d
ISSN:2050-7488
2050-7496
DOI:10.1039/c9ta10128d