Enhanced self-assembly of block copolymers by surface modification of a guiding template
The formation of highly ordered patterns of block copolymers (BCPs) with high χ is important for next-generation lithography applications. We demonstrate here a surface-engineering methodology to enhance the self-assembly of poly(styrene- b -dimethylsiloxane) (PS- b -PDMS) BCPs with high χ by employ...
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Published in | Polymer journal Vol. 50; no. 2; pp. 221 - 229 |
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Main Authors | , , , , |
Format | Journal Article |
Language | English |
Published |
London
Nature Publishing Group UK
01.02.2018
Nature Publishing Group |
Subjects | |
Online Access | Get full text |
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Summary: | The formation of highly ordered patterns of block copolymers (BCPs) with high
χ
is important for next-generation lithography applications. We demonstrate here a surface-engineering methodology to enhance the self-assembly of poly(styrene-
b
-dimethylsiloxane) (PS-
b
-PDMS) BCPs with high
χ
by employing a hydroxyl-terminated polystyrene (PS-OH) brush. By precisely controlling the molecular weight (MW) and weight percent of PS-OH, well-ordered sub-20-nm BCP patterns were obtained over a large area in a short annealing time (<10 min) with the use of guiding templates. We systemically analyzed how the PS-OH brush affects the self-assembly kinetics of BCPs with various MWs and volume fractions. Moreover, the transmission electron microscopy (TEM) results strongly support that the PS-modulated surface plays an important role in the ordering of BCP patterns. We also achieved well-aligned 12 nm line and 18 nm dot patterns within 3 min by means of binary solvent vapor annealing at a moderate temperature under the optimum PS-OH brush conditions. These results provide a new platform for effective engineering and manipulation of the self-assembly of other BCPs for advanced BCP nanotechnologies.
A facile and practical surface-engineering methodology to enhance the self-assembly of PS-
b
-PDMS BCPs with high
χ
by precisely controlling the molecular weight and weight percent of PS brushes. Highly ordered sub-20-nm BCP patterns were successfully obtained in a few minutes under the optimum PS brush condition. |
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ISSN: | 0032-3896 1349-0540 |
DOI: | 10.1038/s41428-017-0007-5 |