Raman scattering and room-temperature visible photoluminescence from Si nanocrystals embedded in SiO2 thin films
Silicon nanocrystals (nc‐Si) embedded in SiO2 glassy mixture have been prepared on glass substrates and silicon and germanium wafers by r.f. co‐sputtering and post‐annealing in a vacuum. Using Raman spectrometry, photoluminescence and electrical conductivity measurements, we have investigated the st...
Saved in:
Published in | Surface and interface analysis Vol. 28; no. 1; pp. 204 - 207 |
---|---|
Main Authors | , , , , |
Format | Journal Article Conference Proceeding |
Language | English |
Published |
Chichester, UK
John Wiley & Sons, Ltd
01.08.1999
Wiley |
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | Silicon nanocrystals (nc‐Si) embedded in SiO2 glassy mixture have been prepared on glass substrates and silicon and germanium wafers by r.f. co‐sputtering and post‐annealing in a vacuum. Using Raman spectrometry, photoluminescence and electrical conductivity measurements, we have investigated the structures and the optical properties of the Si/SiO2 composite films. The results show that Si nanocrystals could be formed in Si/SiO2 composite films by thermal annealing. The growth of nc‐Si is associated with annealing temperature and silicon content. As the size of nc‐Si reaches 5 nm, the intensity of photoluminescence at room temperature is at a maximum and the emitting photon energy is 2.15 eV. Copyright © 1999 John Wiley & Sons, Ltd. |
---|---|
Bibliography: | istex:61D038961C01EECBB432155E44E7E471E3C92CE4 ArticleID:SIA608 National Nature Science Foundation, China ark:/67375/WNG-5G79ZX5Z-G |
ISSN: | 0142-2421 1096-9918 |
DOI: | 10.1002/(SICI)1096-9918(199908)28:1<204::AID-SIA608>3.0.CO;2-O |