Raman scattering and room-temperature visible photoluminescence from Si nanocrystals embedded in SiO2 thin films

Silicon nanocrystals (nc‐Si) embedded in SiO2 glassy mixture have been prepared on glass substrates and silicon and germanium wafers by r.f. co‐sputtering and post‐annealing in a vacuum. Using Raman spectrometry, photoluminescence and electrical conductivity measurements, we have investigated the st...

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Bibliographic Details
Published inSurface and interface analysis Vol. 28; no. 1; pp. 204 - 207
Main Authors Wang, Yinyue, Gong, Hengxiang, Yang, Yinhu, Guo, Yongping, Gan, Runjin
Format Journal Article Conference Proceeding
LanguageEnglish
Published Chichester, UK John Wiley & Sons, Ltd 01.08.1999
Wiley
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Summary:Silicon nanocrystals (nc‐Si) embedded in SiO2 glassy mixture have been prepared on glass substrates and silicon and germanium wafers by r.f. co‐sputtering and post‐annealing in a vacuum. Using Raman spectrometry, photoluminescence and electrical conductivity measurements, we have investigated the structures and the optical properties of the Si/SiO2 composite films. The results show that Si nanocrystals could be formed in Si/SiO2 composite films by thermal annealing. The growth of nc‐Si is associated with annealing temperature and silicon content. As the size of nc‐Si reaches 5 nm, the intensity of photoluminescence at room temperature is at a maximum and the emitting photon energy is 2.15 eV. Copyright © 1999 John Wiley & Sons, Ltd.
Bibliography:istex:61D038961C01EECBB432155E44E7E471E3C92CE4
ArticleID:SIA608
National Nature Science Foundation, China
ark:/67375/WNG-5G79ZX5Z-G
ISSN:0142-2421
1096-9918
DOI:10.1002/(SICI)1096-9918(199908)28:1<204::AID-SIA608>3.0.CO;2-O