Femtosecond laser direct processing in wet and dry silica glass

• Published in: Journal of non-crystalline solids Vol. 355; no. 18; pp. 1057 - 1061
• Main Authors: Lancry, M., Groothoff, N., Guizard, S., Yang, W., Poumellec, B., Kazansky, P.G., Canning, J.
• Format: Journal Article Conference Proceeding
• Language: English
• Published: Oxford Elsevier B.V 01.07.2009; Elsevier
• Subjects: Condensed matter: electronic structure, electrical, magnetic, and optical properties; Exact sciences and technology; Laser–matter interactions; Optical properties; Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation; Physics; Processing; Silica; Stimulated emission; Time-resolved optical spectroscopies and other ultrafast optical measurements in condensed matter; Ultrafast processes and measurements; Water in glass; 81.05.Kf; Ultrafast processes and measurements; 52.30.−q; 78.47.−J; Laser–matter interactions; Optical properties; 06.60.Jn; 52.25.−b; Water in glass; 82.53.−k; Silica; Processing; Electron plasma; 52.25.-b; 82.53.-k; Laser assisted processing; Glass; 78.47.-J; Radiation matter interactions; Ultrafast optics; Laser-matter interactions; Charge carrier trapping; Laser radiation; Silica gel; Damage; 52.30.-q
• ISSN: 0022-3093; 1873-4812
• DOI: 10.1016/j.jnoncrysol.2008.11.034

The infrared femtosecond laser damage threshold is found to be independent of OH content in pure silica glass. Additionally, the density and the mean trapping time of electrons excited in the conduction band are also found to be independent on OH concentration.