Surface morphology of as-deposited and illuminated As–Se chalcogenide thin films

• Published in: Journal of non-crystalline solids Vol. 355; no. 37; pp. 1993 - 1997
• Main Authors: Trunov, M.L., Nagy, P.M., Takats, V., Lytvyn, P.M., Kokenyesi, S., Kalman, E.
• Format: Journal Article Conference Proceeding
• Language: English
• Published: Oxford Elsevier B.V 01.10.2009; Elsevier
• Subjects: Atomic force and scanning tunneling microscopy; Chalcogenides; Condensed matter: structure, mechanical and thermal properties; Exact sciences and technology; Films and coatings; Laser–matter interactions; Optical microscopy; Photoinduced effects; Physics; Solid surfaces and solid-solid interfaces; Surface structure and topography; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties); Vapor phase deposition; Chalcogenides; 67.70.ph; Optical microscopy; Laser–matter interactions; Atomic force and scanning tunneling microscopy; Films and coatings; Photoinduced effects; 68.55.J; 68.35.l; Vapor phase deposition; Roughness; Radiation matter interactions; Thin films; 68.35.1; Vapor deposition; Illumination; Percolation; Chemical composition; Darkening; Vacuum evaporation; Surface morphology; Photodarkening; Amorphous state; Chalcogenide glasses; Laser-matter interactions; Arsenides selenides; Surface deformation; microscopy; Atomic force and scanning tunneling
• ISSN: 0022-3093; 1873-4812
• DOI: 10.1016/j.jnoncrysol.2009.04.055

The role of the composition and of the related changes of the structure in the formation of the surface of amorphous As x Se 1− x (0 < x < 0.5) layers before and after light treatment was investigated by direct measurements of the surface roughness at nanometer-scale and surface deformations at micrometer-scale under influence of illumination. It was established that the surface roughness of the films, deposited by vacuum thermal evaporation, decreased with increasing As content, especially in compositions 0.1 ⩽ x ⩽ 0.3, where the maximum light stimulated surface deformations (localized expansion) occurs. Both relate to the rigidity percolation range and the maximum photoplastic effects, which are not directly connected to the known photodarkening effect, since it is minimal for these compositions.