Scratch resistance and tribological properties of SiOx incorporated diamond-like carbon films deposited by r.f. plasma assisted chemical vapor deposition

SiOx containing diamond-like carbon (DLC) films are deposited on the stainless steel 316 substrates by radio frequency (r.f.) plasma assisted chemical vapor deposition (PACVD) process using plasma of Argon, methane gases and Hexamethyl Disiloxane vapors. The sp3/sp2 ratio of carbon bonding in the fi...

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Published inTribology international Vol. 84; pp. 124 - 131
Main Authors Kumar, N., Barve, S.A., Chopade, S.S., Kar, Rajib, Chand, N., Dash, S., Tyagi, A.K., Patil, D.S.
Format Journal Article
LanguageEnglish
Published Elsevier Ltd 01.04.2015
Subjects
Friction
Scratch resistance
SiOx:DLC
Wear
Friction
SiOx:DLC
Wear
Scratch resistance
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Summary:SiOx containing diamond-like carbon (DLC) films are deposited on the stainless steel 316 substrates by radio frequency (r.f.) plasma assisted chemical vapor deposition (PACVD) process using plasma of Argon, methane gases and Hexamethyl Disiloxane vapors. The sp3/sp2 ratio of carbon bonding in the films is found to increase with increase in bias. Films deposited at low bias voltage (-25V) show onset of film spallation and critical failure during scratch test at low progressive load and it has high friction coefficient. In contrast, film deposited at −100V bias shows low coefficient of friction <0.05. Such a low friction coefficient is related to optimum fraction of sp2 carbon bonding and a-C contents. •SiOx containing DLC films are deposited r.f. PACVD process varying r.f. self bias.•Investigation of scratch resistance and tribological properties at various loads.•Scratch induced failure mechanism.•Low friction coefficient in sp2/a-C dominated film.
ISSN:0301-679X
1879-2464
DOI:10.1016/j.triboint.2014.12.001