High-sensitivity surface micromachined structures for internal stress and stress gradient evaluation

The internal stress and stress gradient of thick (10 mu m) and thin (2 mu m) polysilicon films were evaluated with surface micromachined test structures. The structure that measured internal stress consisted of actuator beams rotating an indicator through

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Bibliographic Details
Published inJournal of micromechanics and microengineering Vol. 7; no. 1; pp. 30 - 36
Main Authors Ericson, Fredric, Greek, Staffan, Söderkvist, Jan, Schweitz, Jan-Åke
Format Journal Article
LanguageEnglish
Published Bristol IOP Publishing 01.03.1997
Institute of Physics
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Summary:The internal stress and stress gradient of thick (10 mu m) and thin (2 mu m) polysilicon films were evaluated with surface micromachined test structures. The structure that measured internal stress consisted of actuator beams rotating an indicator through
ISSN:0960-1317
1361-6439
DOI:10.1088/0960-1317/7/1/006