High-sensitivity surface micromachined structures for internal stress and stress gradient evaluation
The internal stress and stress gradient of thick (10 mu m) and thin (2 mu m) polysilicon films were evaluated with surface micromachined test structures. The structure that measured internal stress consisted of actuator beams rotating an indicator through
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Published in | Journal of micromechanics and microengineering Vol. 7; no. 1; pp. 30 - 36 |
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Main Authors | , , , |
Format | Journal Article |
Language | English |
Published |
Bristol
IOP Publishing
01.03.1997
Institute of Physics |
Subjects | |
Online Access | Get full text |
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Summary: | The internal stress and stress gradient of thick (10 mu m) and thin (2 mu m) polysilicon films were evaluated with surface micromachined test structures. The structure that measured internal stress consisted of actuator beams rotating an indicator through |
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ISSN: | 0960-1317 1361-6439 |
DOI: | 10.1088/0960-1317/7/1/006 |