Comparison of approaches in the manufacture of broadband mirrors for the EUV range: aperiodic and stack structures

We have developed the design and experimentally studied aperiodic and stack broadband Mo/Si mirrors for the purposes of the KORTES project, optimised for uniform reflection in the 17 - 21 nm wavelength range. It is shown that stack structures with an insignificant loss in the reflection coefficient...

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Bibliographic Details
Published inQuantum electronics (Woodbury, N.Y.) Vol. 49; no. 4; pp. 380 - 385
Main Authors Barysheva, M.M., Garakhin, S.A., Zuev, S.Yu, Polkovnikov, V.N., Salashchenko, N.N., Svechnikov, M.V., Chkhalo, N.I., Yulin, S.
Format Journal Article
LanguageEnglish
Published Bristol Kvantovaya Elektronika, Turpion Ltd and IOP Publishing 01.04.2019
IOP Publishing
Subjects
aperiodic structures
block structures
Broadband
broadband mirrors
CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS
DEPOSITION
EUV
inverse problem
magnetron sputtering
Mathematical analysis
MIRRORS
MOLYBDENUM
Multilayers
Reflectance
REFLECTION
SILICON
stack structures
WAVELENGTHS
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Summary:We have developed the design and experimentally studied aperiodic and stack broadband Mo/Si mirrors for the purposes of the KORTES project, optimised for uniform reflection in the 17 - 21 nm wavelength range. It is shown that stack structures with an insignificant loss in the reflection coefficient are much more preferable from the point of view of manufacturing and certification, which, in turn, makes it possible to correct the deposition process and to reach the calculated parameters of a multilayer mirror in a small number of iterations.
ISSN:1063-7818
1468-4799
DOI:10.1070/QEL16990