ANTI-REFLECTIVE POLYMER COATINGS IN OPTICAL MICROLITHOGRAPHY

• Published in: Journal of macromolecular science. Part A, Pure and applied chemistry Vol. 39; no. 1-2; pp. 1 - 16
• Main Authors: De, Binod, Malik, Sanjay, Dilocker, Stephanie, Spaziano, Gregory, Biafore, John, Bowden, Murrae
• Format: Journal Article
• Language: English
• Published: Colchester Taylor & Francis Group 25.03.2002; Taylor & Francis
• Subjects: Anti-reflective coating (ARC); Applied sciences; Curing properties; DUV lithography; Etch selectivity; Exact sciences and technology; Optical parameters; Organic polymers; Physicochemistry of polymers; Polymers with particular properties; Preparation, kinetics, thermodynamics, mechanism and catalysts; Styrene(hydroxy) copolymer; Coating material; Property composition relationship; Crosslinking; Hydroxyethyl methacrylate copolymer; Styrene derivative copolymer; Experimental study; Thermal stability; Crosslinked copolymer; Aryl methacrylate copolymer; Optical properties; Triazine derivatives; Photolithography; Antireflection coating
• ISSN: 1060-1325; 1520-5738
• DOI: 10.1081/MA-120006514

Dedicated to the memory of Professor Sukant K. Tripathy The use of polymers based on biphenyl methacrylate as antireflective coatings (ARC) in lithographic applications is described. The optimum range of refractive index (n) and complex index (k) resulting in minimal reflectivity, as predicted by Prolith simulation, was 1.56 to 1.76 and 0.125 to 0.275, respectively, which corresponded to polymers containing 50 to 70 mol% of biphenyl methacrylate. ARCs from these polymers were formulated with a melamine crosslinker and a thermally activated catalyst. Optimal lithographic performance was obtained by baking the spin-coated films at 200°C for 90 seconds for crosslinker concentrations less than 7.5% as confirmed by lack of footing and scum at imaging layer/ARC interface.