Thin-Layer Chromatography of Aluminium: Quantitative Densitometric Determination of Fe2+, Ni2+, Cu2+, and Si4

• Published in: Journal of chromatographic science Vol. 45; no. 5; pp. 263 - 268
• Main Authors: Mohamed Najar, P.A., Chouhan, R.N., Jeurkar, J.U., Dolas, S.D., Ramana Rao, K.V.
• Format: Journal Article
• Language: English
• Published: Niles, IL Oxford University Press 01.05.2007; Preston Publications
• Subjects: Analysing. Testing. Standards; Analytical chemistry; Applied sciences; Chemistry; Chromatographic methods and physical methods associated with chromatography; Exact sciences and technology; Metals. Metallurgy; Other chromatographic methods; Standardization and quality control; Divalent metal Ions; Nickel II Ions; Chemical analysis; Impurity; Purity control; Aluminium; Metal; Aluminium Alloys; Silicon IV Ions; Iron II Ions; Thin layer chromatography; Densitometry; Copper II Ions; Quantitative analysis
• ISSN: 0021-9665; 1945-239X
• DOI: 10.1093/chromsci/45.5.263

Thin-layer chromatography in combination with scanning densitometry is used as a tool for the quantitative determination of some impurity and additive elements in aluminium. Microgram levels of iron, silicon, copper, nickel, titanium, magnesium, manganese, and zinc present in a high concentration aluminium matrix is detected, and selective separations of some of these elements are achieved on silica gel H layers developed with a mobile phase containing aqueous sodium chloride solution. The quantitative determination of iron, silicon, nickel, and copper are obtained from the densitometric evaluation of chromatograms and are compared with the respective optical emission spectral analytical data.