Properties of nanocrystalline Si layers embedded in structure of solar cell

Suppression of spectral reflectance from the surface of solar cell is necessary for achieving a high energy conversion efficiency. We developed a simple method for forming nanocrystalline layers with ultralow reflectance in a broad range of wavelengths. The method is based on metal assisted etching...

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Published inJournal of Electrical Engineering Vol. 68; no. 7; pp. 48 - 52
Main Authors Jurečka, Stanislav, Imamura, Kentaro, Matsumoto, Taketoshi, Kobayashi, Hikaru
Format Journal Article
LanguageEnglish
Published Bratislava De Gruyter Open 01.12.2017
De Gruyter Poland
Subjects
Embedded structures
Energy conversion efficiency
Etching
Forming
Fourier analysis
Image transmission
Microstructure
Nanocrystals
Photovoltaic cells
Reflectance
semiconductor
Silicon
silicon solar cell
Silicon wafers
Spectral reflectance
Statistical methods
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Abstract Suppression of spectral reflectance from the surface of solar cell is necessary for achieving a high energy conversion efficiency. We developed a simple method for forming nanocrystalline layers with ultralow reflectance in a broad range of wavelengths. The method is based on metal assisted etching of the silicon surface. In this work, we prepared Si solar cell structures with embedded nanocrystalline layers. The microstructure of embedded layer depends on the etching conditions. We examined the microstructure of the etched layers by a transmission electron microscope and analysed the experimental images by statistical and Fourier methods. The obtained results provide information on the applied treatment operations and can be used to optimize the solar cell forming procedure.
AbstractList Suppression of spectral reflectance from the surface of solar cell is necessary for achieving a high energy conversion efficiency. We developed a simple method for forming nanocrystalline layers with ultralow reflectance in a broad range of wavelengths. The method is based on metal assisted etching of the silicon surface. In this work, we prepared Si solar cell structures with embedded nanocrystalline layers. The microstructure of embedded layer depends on the etching conditions. We examined the microstructure of the etched layers by a transmission electron microscope and analysed the experimental images by statistical and Fourier methods. The obtained results provide information on the applied treatment operations and can be used to optimize the solar cell forming procedure.
Author Jurečka, Stanislav
Kobayashi, Hikaru
Imamura, Kentaro
Matsumoto, Taketoshi
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Snippet Suppression of spectral reflectance from the surface of solar cell is necessary for achieving a high energy conversion efficiency. We developed a simple method...
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StartPage 48
SubjectTerms Embedded structures
Energy conversion efficiency
Etching
Forming
Fourier analysis
Image transmission
Microstructure
Nanocrystals
Photovoltaic cells
Reflectance
semiconductor
Silicon
silicon solar cell
Silicon wafers
Spectral reflectance
Statistical methods
Title Properties of nanocrystalline Si layers embedded in structure of solar cell
URI https://www.degruyter.com/doi/10.1515/jee-2017-0055
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