Properties of nanocrystalline Si layers embedded in structure of solar cell

Suppression of spectral reflectance from the surface of solar cell is necessary for achieving a high energy conversion efficiency. We developed a simple method for forming nanocrystalline layers with ultralow reflectance in a broad range of wavelengths. The method is based on metal assisted etching...

Full description

Saved in:
Bibliographic Details
Published inJournal of Electrical Engineering Vol. 68; no. 7; pp. 48 - 52
Main Authors Jurečka, Stanislav, Imamura, Kentaro, Matsumoto, Taketoshi, Kobayashi, Hikaru
Format Journal Article
LanguageEnglish
Published Bratislava De Gruyter Open 01.12.2017
De Gruyter Poland
Subjects
Embedded structures
Energy conversion efficiency
Etching
Forming
Fourier analysis
Image transmission
Microstructure
Nanocrystals
Photovoltaic cells
Reflectance
semiconductor
Silicon
silicon solar cell
Silicon wafers
Spectral reflectance
Statistical methods
Online AccessGet full text

Cover

More Information
Summary:Suppression of spectral reflectance from the surface of solar cell is necessary for achieving a high energy conversion efficiency. We developed a simple method for forming nanocrystalline layers with ultralow reflectance in a broad range of wavelengths. The method is based on metal assisted etching of the silicon surface. In this work, we prepared Si solar cell structures with embedded nanocrystalline layers. The microstructure of embedded layer depends on the etching conditions. We examined the microstructure of the etched layers by a transmission electron microscope and analysed the experimental images by statistical and Fourier methods. The obtained results provide information on the applied treatment operations and can be used to optimize the solar cell forming procedure.
Bibliography:ObjectType-Article-1
SourceType-Scholarly Journals-1
ObjectType-Feature-2
content type line 14
ISSN:1339-309X
1335-3632
1339-309X
DOI:10.1515/jee-2017-0055