Trades-off between lithography line edge roughness and error-correcting codes requirements for NAND Flash memories
The only way to keep pace with Moore’s Law is to use probabilistic computing for memory design. Probabilistic computing is ‘unavoidable’, especially when scaled memory dimensions go down to the levels where variability takes over. In order to print features below 20nm, novel lithographies such as Ex...
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Published in | Microelectronics and reliability Vol. 52; no. 3; pp. 525 - 529 |
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Main Authors | , , , , , , , |
Format | Journal Article |
Language | English |
Published |
Kidlington
Elsevier Ltd
01.03.2012
Elsevier |
Subjects | |
Online Access | Get full text |
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Summary: | The only way to keep pace with Moore’s Law is to use probabilistic computing for memory design. Probabilistic computing is ‘unavoidable’, especially when scaled memory dimensions go down to the levels where variability takes over. In order to print features below 20nm, novel lithographies such as Extreme Ultra Violet (EUV) are required. However, transistor structures and memory arrays are strongly affected by pattern roughness caused by the randomness of such lithography, leading to variability induced data errors in the memory read-out. This paper demonstrates a probabilistic–holistic look at how to handle bit errors of NAND Flash memory and trades-off between lithography processes and error-correcting codes to ensure the data integrity. |
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Bibliography: | ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
ISSN: | 0026-2714 1872-941X |
DOI: | 10.1016/j.microrel.2011.09.037 |