Design optimization of SiGe BiCMOS Silicon Controlled Rectifier for Charged Device Model (CDM) protection applications

•We optimized the SCRs in SiGe/BiCMOS process for Charged Device Model ESD.•We provided the TCAD simulation method for CDM ESD protection.•We investigated the SCRs by using very fast Transmission Line Pulse. Silicon Controlled Rectifier (SCR) devices fabricated in a SiGe BiCMOS technology are optimi...

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Published inMicroelectronics and reliability Vol. 54; no. 1; pp. 57 - 63
Main Authors Cui, Qiang, Parthasarathy, Srivatsan, Salcedo, Javier A., Liou, Juin J., Hajjar, Jean J., (Paul) Zhou, Yuanzhong
Format Journal Article
LanguageEnglish
Published Kidlington Elsevier Ltd 01.01.2014
Elsevier
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Summary:•We optimized the SCRs in SiGe/BiCMOS process for Charged Device Model ESD.•We provided the TCAD simulation method for CDM ESD protection.•We investigated the SCRs by using very fast Transmission Line Pulse. Silicon Controlled Rectifier (SCR) devices fabricated in a SiGe BiCMOS technology are optimized for Charged Device Model (CDM) Electrostatic Discharge (ESD) protection. This optimization involves combined experimental and Technology Computer Aided Design (TCAD) ESD simulation analysis of the quasi-static current–voltage and transient response characteristics during fast stress conditions. The underlying physical mechanisms critical to the device design are demonstrated based on very fast transmission line pulsing (VFTLP) measurement and physics-based simulation results.
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content type line 23
ISSN:0026-2714
1872-941X
DOI:10.1016/j.microrel.2013.09.021