Nucleation of 3C-SiC associated with threading edge dislocations during chemical vapor deposition
Transmission electron microscopy and atomic force microscopy were used to study the origin of a preferred nucleation site on the atomically flat 3C-SiC mesas leading to the formation of tetrahedral hillocks. The hillocks exhibit a “wedding cake” structure consisting of concentric triangular terraces...
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Published in | Journal of crystal growth Vol. 347; no. 1; pp. 45 - 48 |
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Main Authors | , , , , |
Format | Journal Article |
Language | English |
Published |
Amsterdam
Elsevier B.V
15.05.2012
Elsevier |
Subjects | |
Online Access | Get full text |
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Summary: | Transmission electron microscopy and atomic force microscopy were used to study the origin of a preferred nucleation site on the atomically flat 3C-SiC mesas leading to the formation of tetrahedral hillocks. The hillocks exhibit a “wedding cake” structure consisting of concentric triangular terraces with a step height of 0.25nm corresponding to the thickness of a single Si-C bilayer. KOH etching revealed the presence of a threading dislocation at the center of the hillock. Its Burgers vector was shown to lie in the basal plane with no component along the surface normal. It is argued that the strain fields around a threading edge dislocation make it a preferred nucleation site.
► Repeated nucleation of epitaxial 3C-SiC at particular sites formed tetrahedral hillocks. ► The hillocks had triangular concentric terraces with 0.25nm step height. ► The hillocks were produced at a threading edge dislocation. ► Dislocation-induced strain is hypothesized to be responsible of the preferred nucleation. |
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Bibliography: | ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
ISSN: | 0022-0248 1873-5002 |
DOI: | 10.1016/j.jcrysgro.2012.03.014 |