p-type non-polar m-plane ZnO films grown by plasma-assisted molecular beam epitaxy

Non-polar ZnO thin films were grown epitaxially on m-plane sapphire substrates using plasma-assisted molecular beam epitaxy. The film is (1 0 1¯ 0) oriented ( m-plane) as identified by the X-ray diffraction pattern. The surface of ZnO film shows highly anisotropic morphology with stripes elongated a...

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Published inJournal of crystal growth Vol. 331; no. 1; pp. 15 - 17
Main Authors Ding, P., Pan, X.H., Huang, J.Y., He, H.P., Lu, B., Zhang, H.H., Ye, Z.Z.
Format Journal Article
LanguageEnglish
Published Amsterdam Elsevier B.V 15.09.2011
Elsevier
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Summary:Non-polar ZnO thin films were grown epitaxially on m-plane sapphire substrates using plasma-assisted molecular beam epitaxy. The film is (1 0 1¯ 0) oriented ( m-plane) as identified by the X-ray diffraction pattern. The surface of ZnO film shows highly anisotropic morphology with stripes elongated along the c-axis. The nonintentionally doped non-polar ZnO film was grown under oxygen-rich condition, which exhibits weak p-type conductivity with a hole concentration of 1.3×10 16 cm −3, a Hall mobility of 0.314 cm 2 V −1 s −1, and a resistivity of 1536 Ω cm. Room-temperature photoluminescence of the p-type non-polar ZnO shows a strong UV emission at ∼3.307 eV and negligible deep level emission. ► Non-polar m-plane ZnO films were grown on m-plane sapphire substrates using PAMBE. ► ZnO film shows highly anisotropic morphology with stripes elongated along c-axis. ► Nonintentionally doped non-polar ZnO film exhibits weak p-type conductivity. ► Room-temperature PL shows strong NBE emission and negligible deep level emission.
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ISSN:0022-0248
1873-5002
DOI:10.1016/j.jcrysgro.2011.07.004