Effects of artificial frost hardening and winter stress on net photosynthesis, photosynthetic electron transport and RuBP carboxylase activity in seedlings of Pinus silvestris [chloroplasts, photosynthetic quantum yield]

Net photosynthesis of seedlings of Pinus silvestris has been measured and compared with the activities of photosynthetic electron transport and extracted RuBP carboxylase. The effects of prolonged frost hardening (photoperiod 8 h, +3deg C) followed by winter stress at subzero temperatures were analy...

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Published inPhysiologia plantarum Vol. 48; no. 4
Main Authors Oequist, G, Brunes, L, Haellgren, J.-E, Gezelius, K, Hallen, M, Malmberg, G. (Umeaa Univ. (Sweden). Dept. of Plant Physiology)
Format Journal Article
LanguageEnglish
Published 01.04.1980
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Summary:Net photosynthesis of seedlings of Pinus silvestris has been measured and compared with the activities of photosynthetic electron transport and extracted RuBP carboxylase. The effects of prolonged frost hardening (photoperiod 8 h, +3deg C) followed by winter stress at subzero temperatures were analysed. There was a parallel effect of frost hardening and winter stress on the photosynthetic properties of both intact seedlings and isolated chloroplast thylakoids. The activity of extracted RuBP carboxylase was less affected by the treatments. In relation to earlier works we conclude that the decay of net photosynthesis in winter climate is determined by the electron transport properties of the chloroplast thylakoids, i.e. by the pool sizes of photosynthetically active plastoquinone. The results of this work justify the definition of two phases in the response of conifers towards autumn and winter climates: I. Frost hardening occurs at temperatures slightly above zero and it does not affect the efficiency of photosynthesis as defined by the quantum yield at rate limiting light absorption. II. Winter stress occurs at subzero temperatures and it is characterized by a suppression of the photosynthetic efficiency as a result of damage within the photosynthetic apparatus
Bibliography:F60
8020623
ISSN:0031-9317
1399-3054
DOI:10.1111/j.1399-3054.1980.tb03299.x