Cratering response method to study the effect of ultrasonic energy on Cu-wire bonding quality

The paper presents a method for 50μm Cu-wire bonding to study sub-percentage assembly yield loss due to cratering, so called “in-process” cratering. Test vehicle is an audio amplifier device assembled in a surface mount power package (HSOP). The method is based on high temperature aging followed by...

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Bibliographic Details
Published inMicroelectronics and reliability Vol. 51; no. 9-11; pp. 1865 - 1868
Main Authors Rongen, R.T.H., van IJzerloo, A., Cotofana, C., Lan, K.M.
Format Journal Article Conference Proceeding
LanguageEnglish
Published Kidlington Elsevier Ltd 01.09.2011
Elsevier
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Summary:The paper presents a method for 50μm Cu-wire bonding to study sub-percentage assembly yield loss due to cratering, so called “in-process” cratering. Test vehicle is an audio amplifier device assembled in a surface mount power package (HSOP). The method is based on high temperature aging followed by wire pull testing and has successfully been applied to determine the upper limit of the bond energy process window. After implementation in production, the shift to lower bond energy was controlled via regular ball shear production monitor and “in-process” cratering was no longer observed.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0026-2714
1872-941X
DOI:10.1016/j.microrel.2011.07.041