Structure and Mechanical Properties of CrN Thick Films Deposited by High-Rate Medium-Frequency Magnetron Sputtering

A home-made electron source assisted medium-frequency （MF） magnetron sputter- ing system was used to deposit thick CrN films on silicon and tungsten carbide substrates at various nitrogen flow rates with a fixed total pressure （0.3 Pa） and MF power （11.2 kW）. Result from scanning electron microscopy...

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Bibliographic Details
Published inPlasma science & technology Vol. 12; no. 4; pp. 442 - 446
Main Author 刘传胜 王红军 周霖 张瑞 田灿鑫 黎明 付德君
Format Journal Article
LanguageEnglish
Published IOP Publishing 01.08.2010
Subjects
Chromium nitride
Deposition
Diffraction
Electron sources
Hardness
Magnetron sputtering
Silicon substrates
Thick films
X-rays
中频电源
力学性能
扫描电子显微镜
柱状结构
氮化铬
沉积率
磁控溅射
高速率
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ISSN1009-0630
DOI10.1088/1009-0630/12/4/12

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Summary:A home-made electron source assisted medium-frequency （MF） magnetron sputter- ing system was used to deposit thick CrN films on silicon and tungsten carbide substrates at various nitrogen flow rates with a fixed total pressure （0.3 Pa） and MF power （11.2 kW）. Result from scanning electron microscopy showed that the deposited CrN films have clear columnar struc- ture, and X-ray diffraction revealed a preferred orientation of CrN （200） for samples prepared at a rate of N2/（N2＋Ar） below 60%, whereas those prepared at higher N2/（N2＋Ar） rate are dom- inated by Cr2N. Deposition rates up to 12.5 μm/h were achieved and the hardness of the CrN coatings were in a range of 11 GPa to 18 GPa.
Bibliography:O484.1
CrN, electron source, medium frequency magnetron sputtering, structure, hardness
34-1187/TL
TN86
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ISSN:1009-0630
DOI:10.1088/1009-0630/12/4/12