IPVD deposition of titanium based thin films

Classical magnetron sputtering assisted with an additional ionization device, especially a radio-frequency coil, is a well-known technique to improve the deposited layer qualities. The aim of this work is to characterize the deposition of titanium based thin films either in the plasma or in the depo...

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Published inSurface & coatings technology Vol. 200; no. 1-4; pp. 717 - 720
Main Authors Imbert, J.C., de Poucques, L., Boisse-Laporte, C., Bretagne, J., Hugon, M.C., Teulé-Gay, L., Touzeau, M., Shtansky, D., Voldoire, O.
Format Journal Article
LanguageEnglish
Published Elsevier B.V 01.10.2005
Subjects
IPVD
Materials
Radio-frequency
Thin films
Titanium
Thin films
Radio-frequency
Titanium
IPVD
Materials
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Summary:Classical magnetron sputtering assisted with an additional ionization device, especially a radio-frequency coil, is a well-known technique to improve the deposited layer qualities. The aim of this work is to characterize the deposition of titanium based thin films either in the plasma or in the deposited layer. With a RF power of 500 W and a pressure of 5 Pa, we measured an ionization ratio of 20%. In this condition, the density of the film is higher, and the oxygen contamination is lower than with a PVD deposited film.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0257-8972
1879-3347
DOI:10.1016/j.surfcoat.2005.01.088